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Boron Trifluoride 11 Electronic Specialty Gas Products

Boron Trifluoride 11 Electronic Specialty Gas

Boron trifluoride 11 (BF₃-11) is a critical electronic specialty gas used in semiconductor manufacturing, particularly for ion implantation and high-end display panel processes. Our product leverages advanced isotopic separation technology to ensure high purity and stable isotopic abundance. Ion Implantation for Advanced Process Chips: In 5nm, 3nm, and other advanced process nodes, BF₃ with high isotopic abundance (99.99%) excels not only in traditional ion implanters but also in Plasma Immersion Ion Implantation (PIII) systems. PIII eliminates the need for conventional beamline components such as magnetic mass analyzers, deflection magnets, and slit-based mass filters. As a next-generation non-beamline architecture, it is essential for fabricating 3D devices, ultra-shallow junctions, and SOI structures in advanced chips. BF₃ with high isotopic abundance (99.99%) is the preferred specialty gas material for this application.

Technical Specifications

Product Purity≥99.999%
B-11 Isotopic Abundance≥99.99%
O2+Ar+N2+CH4+CO+CO2≤4.5 ppm
SO2+SiF4+HF≤5.5 ppm
Package Specifications47L cylinder, 2.2L negative pressure adsorption cylinder, 2.2L hydrogen-mixed safety cylinder

Application Areas

  • Ion Implantation for Advanced Process Chips
  • High-Reliability Chip Radiation Hardening Upgrade
  • High-end display panel ion implantation
  • Optical fiber preform fabrication
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Boron Trifluoride 11 Hydrogen-Mixed Electronic Specialty Gas Product

Boron Trifluoride 11/Boron Trifluoride 11 Hydrogen-Mixed Filling Line

Currently, end users utilizing 11BF3 as an ion source for semiconductor ion implantation must reduce cylinder volume and install it on ion implanters within cleanrooms. As a closed system, if an operator drops a container causing a leak, toxic gas could injure personnel in the cleanroom and halt operations. Therefore, 11BF3 is maintained under negative pressure in cylinders; even in the event of a leak, there will be no environmental impact. Introducing hydrogen into boron trifluoride effectively extends the emitter life of the ion implanter's ion source. To meet customer requirements for various product forms, we have introduced an advanced boron trifluoride 11/hydrogen-mixed filling line.

Product Purity≥99.999%
B-11 Isotopic Abundance≥99.99%
Hydrogen Content0.1%-1%
Total Impurities≤10 ppm
Package Specifications2.2L Hydrogen-Blended Safety Cylinder

Technical Advantages

Why Choose Zhengbounuo's Boron Trifluoride 11 Products

High Purity Guaranteed

Utilizes advanced purification technology to ensure product purity exceeds 99.999%, meeting the stringent material purity requirements of semiconductor processes.

Stable Isotope Abundance

Professional isotope separation technology ensures B-11 isotopic abundance remains stable above 99.99% with excellent batch-to-batch consistency.

Strict Quality Control

Robust quality management system and advanced testing equipment ensure every batch meets semiconductor-grade standards.