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Specializing in electronic specialty gases, providing high-quality material solutions for the semiconductor industry.
Boron Trifluoride 11 Electronic Specialty Gas
Boron trifluoride 11 (BF₃-11) is a critical electronic specialty gas used in semiconductor manufacturing, particularly for ion implantation and high-end display panel processes. Our product leverages advanced isotopic separation technology to ensure high purity and stable isotopic abundance. Ion Implantation for Advanced Process Chips: In 5nm, 3nm, and other advanced process nodes, BF₃ with high isotopic abundance (99.99%) excels not only in traditional ion implanters but also in Plasma Immersion Ion Implantation (PIII) systems. PIII eliminates the need for conventional beamline components such as magnetic mass analyzers, deflection magnets, and slit-based mass filters. As a next-generation non-beamline architecture, it is essential for fabricating 3D devices, ultra-shallow junctions, and SOI structures in advanced chips. BF₃ with high isotopic abundance (99.99%) is the preferred specialty gas material for this application.
Technical Specifications
Application Areas
- Ion Implantation for Advanced Process Chips
- High-Reliability Chip Radiation Hardening Upgrade
- High-end display panel ion implantation
- Optical fiber preform fabrication
Boron Trifluoride 11/Boron Trifluoride 11 Hydrogen-Mixed Filling Line
Currently, end users employing 11BF3 as an ion source in semiconductor ion implantation must reduce cylinder volume and install it on ion implanters within the cleanroom. As a closed system, if an operator drops a container causing a leak, toxic gas could injure personnel inside the cleanroom, resulting in production downtime. 11BF3 is maintained under negative pressure in the cylinder; even in the event of a leak, it poses no environmental risk. Introducing hydrogen into boron trifluoride effectively extends the emitter lifespan of the ion implanter's ion source. To meet customer demands for various product formats, our company has introduced an advanced 11/hydrogen-mixed filling line.
Technical Advantages
Why Choose Zhengbounuo's Boron Trifluoride 11 Products
High Purity Guaranteed
Utilizes advanced purification technology to ensure product purity exceeds 99.999%, meeting the stringent material purity requirements of semiconductor processes.
Stable Isotope Abundance
Professional isotope separation technology ensures B-11 isotopic abundance remains stable above 99.99% with excellent batch-to-batch consistency.
Strict Quality Control
Robust quality management system and advanced testing equipment ensure every batch meets semiconductor-grade standards.